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During Your Residency: Plan Your Next Residency

Overview

If you have additional residency requirements left to complete for your program, visit the Residency Calendar.

Refer to the Residency Timing table for complete information about when to complete your required residencies.

  • Academic residencies taking place through August 2017 are open for registration. Residencies taking place September through December 2017 will open for registration in April.
  • Be sure to register 3-4 months in advance of the residency start date to reserve your space. Seating is limited.

Contact Student Success Advising if you need further assistance planning your next residency. 

Optional Capstone Intensives (for DBA, DIT, EdD, DNP and PhD candidates)

Walden offers optional capstone intensive retreats for candidates seeking additional support for writing their dissertation, doctoral or project study. Participants in these optional experiences take advantage of additional, focused writing support for their capstone project and rave about the progress they make in their capstone writing during these short retreats. Attendees utilize concentrated time away from work, personal and family obligations to advance their capstone writing and enhance their motivation to complete their capstone projects.

View the capstone intensive retreats website to learn more. Then contact Student Success Advising to register today. Spaces fill quickly and seating is limited to 15-30 students at each location to allow for individualized attention and feedback.

Optional Skills Intensives (for IOP and Forensic Psych candidates)

Walden offers optional skill intensive retreats for candidates seeking to enhance discipline-specific skills in the areas of consulting (CSI) and forensic psychology special topics (FPSTI).

View the intensive retreats website to learn more. Then contact Student Success Advising to register today. Spaces fill quickly and seating is limited to about 15 students at each location to allow for individualized attention and feedback.